Editor: Kunihiro Suzuki

Ion Implantation and Activation

Volume 1

eBook: US $79 Special Offer (PDF + Printed Copy): US $192
Printed Copy: US $153
Library License: US $316
ISSN: 2589-2940 (Print)
ISSN: 2215-0005 (Online)
ISBN: 978-1-60805-782-5 (Print)
ISBN: 978-1-60805-781-8 (Online)
Year of Publication: 2013
DOI: 10.2174/97816080578181130101


Ion Implantation and Activation – Volume 1 presents the derivation process of related models in a comprehensive step by step manner starting from the fundamental processes and moving up into the more advanced theories.

Ion implantation can be expressed theoretically as a binary collision, and, experimentally using various mathematical functions. Readers can understand how to establish an ion implantation database by combining theory and experimental data. The models described in this ebook can be directly related to practical experimental data with various approaches: physical, empirical or experimental. Readers can also understand the approximations, and assumptions to reach these models. Chapters in the book explain, in depth, various topics such as Pearson functions, LSS theory, Monte Carlo simulations, Edgeworth Polynomials and much more.

This book provides advanced engineering and physics students and researchers with complete and coherent coverage of modern semiconductor process modeling. Readers can also benefit from this volume by acquiring the necessary information to improve contemporary process models by themselves.


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