Editors: Filipe Vaz, Nicolas Martin, Martin Fenker

Metallic Oxynitride Thin Films by Reactive Sputtering and Related Deposition Methods: Process, Properties and Applications

eBook: US $89 Special Offer (PDF + Printed Copy): US $184
Printed Copy: US $140
Library License: US $356
ISBN: 978-1-60805-157-1 (Print)
ISBN: 978-1-60805-156-4 (Online)
Year of Publication: 2013
DOI: 10.2174/97816080515641130101

Introduction

Oxynitride thin film technology is rapidly impacting a broad spectrum of applications, ranging from decorative functions (through optoelectronics) to corrosion resistance. Developing a better understanding of the relationships between deposition processes, structure and composition of the deposited films is critical to the continued evolution of these applications. This e-book provides valuable information about the process modeling, fabrication and characterization of metallic oxynitride-based thin films produced by reactive sputtering and some related deposition processes. Its contents are spread in twelve main and concise chapters through which the book thoroughly reviews the bases of oxynitride thin film technology and deposition processes, sputtering processes and the resulting behaviors of these oxynitride thin films. More importantly, the solutions for the growth of oxynitride technology are given in detail with an emphasis on some particular compounds. This is a valuable resource for academic learners studying materials science and industrial coaters, who are concerned not only about fundamental aspects of oxynitride synthesis, but also by their innate material characteristics.

Contributors

Editor(s):
Filipe Vaz
Minho University
Portugal


Nicolas Martin
National Engineering School ENSMM
France


Martin Fenker
FEM Forschungsinstitut Edelmetalle & Metallchemie
Germany




Contributor(s):
Agouram Said
Department of Applied Physics and Electromagnetism
Univesitat de Valencia
C./ Dr. Moliner N 50
Burjassot, 46100
Spain


Alves Eduardo
Instituto Superior Técnico/ITN, Universidade Técnica de Lisboa, E.N. 10
Sacavém, 2686-953
Portugal


Barradas N. Pessoa
Instituto Superior Técnico/ITN, Universidade Técnica de Lisboa, E.N. 10
Sacavém, 2686-953
Portugal


Beaufort Marie-France
Département de Physique et Mécanique des Matériaux
Institut PRIME - UPR 3346 CNRS, Université de Poitiers-ENSMA
Bât. SP2MI - Téléport 2, BP 30179, 86962 Futuroscope Chasseneuil Cedex,
France


Berg Sören
Solid State Electronics Division, The Ångström Laboratory, Uppsala University
Box 534
Uppsala, 75121
Sweden


Besnard Aurélien
LaBoMaP, Centre Arts et Métiers ParisTech de Cluny
Rue porte de Paris
Cluny, 71250
France


Bodart Franz
Department of Physics, LARN, FUNDP
61, Rue de Bruxelles
Namur, 5000
Belgium


Borges Joel
Centro de Física, Universidade do Minho
Braga, 4710-057
Portugal


Camelio Sophie
Département de Physique et Mécanique des Matériaux
Institut PRIME - UPR 3346 CNRS, Université de Poitiers-ENSMA
Bât. SP2MI - Téléport 2, BP 30179
Futuroscope Chasseneuil Cedex, 86962
France


Carvalho Pedro
Centro de Física, Universidade do Minho
Chappé Jean-Marie
Braga, 4710-057
Portugal
/
Institut FEMTO-ST, 32, Avenue de l’observatoire
Besançon Cedex, 25044
France


Cunha Luis
Centro de Física, Universidade do Minho
Braga, 4710-057
Portugal


Depla Diederik
Department of Solid State Sciences
Ghent University
Krijgslaan, 281(S1)
Ghent, 9000
Belgium


Espinos J. Pedro
Instituto de Cienca de Materiales de Sevilla
CSIC University Sevilla, Avda Américo Vespucio s/n
Sevilla, 41092
Spain


Eyidi Dominique
Département de Physique et Mécanique des Matériaux, Bât. SP2MI - Téléport 2, BP 30179
Institut PRIME - UPR 3346 CNRS, Université de Poitiers-ENSMA
Futuroscope Chasseneuil Cedex, 86962
France


Feng Li-Ping
State Key Lab of Solidification Processing, College of Materials Science and Engineering
Northwestern Polytechnical University
Xi’an, 710072
People’s Republic of China


Fenker Martin
FEM – Forschungsinstitut Edelmetalle und Metallchemie
Katharinenstrabe 17
Schwäbisch Gmünd, 73525
Germany


Girardeau Thierry
Département de Physique et Mécanique des Matériaux, Bât. SP2MI - Téléport 2, BP 30179
Institut PRIME - UPR 3346 CNRS, Université de Poitiers-ENSMA
Futuroscope Chasseneuil Cedex, 86962
France


Huang Jia-Hong
Department of Engineering and System Science
National Tsing Hua University
101, Kuang Fu Road, Section 2
Hsinchu
Taiwan, R.O.C


Lintymer Jan
Comadur SA, Le Col 33, 2400 Le Locle
Switzerland


Liu Zheng-Tang
State Key Lab of Solidification Processing, College of Materials Science and Engineering
Northwestern Polytechnical University
Xi’an, 710072
People’s Republic of China


Marques Luis
Centro de Física
Universidade do Minho
Braga, 4710-057
Portugal


Liu Zheng-Tang
Centro de Física, Universidade do Minho
Braga, 4710-057
Portugal


Martin Nicolas
Institut FEMTO-ST, Département MN2S, 32, Avenue de l’observatoire
Northwestern Polytechnical University
Besançon Cedex, 25044
France


Nyberg Tomas
Solid State Electronics Division, The Ångström Laboratory
Uppsala University
Box 534
Uppsala, 75121
Sweden


Paumier Fabien
Département de Physique et Mécanique des Matériaux,
Institut PRIME - UPR 3346 CNRS, Université de Poitiers-ENSMA
Bât. SP2MI - Téléport 2, BP 30179
Futuroscope Chasseneuil Cedex, 86962
France


Riviere Jean-Paul
Département de Physique et Mécanique des Matériaux
Institut PRIME - UPR 3346 CNRS, Université de Poitiers-ENSMA
Bât. SP2MI - Téléport 2, BP 30179
Futuroscope Chasseneuil Cedex, 86962
France


Sarakinos Kostas
Plasma and Coatings Physics Division, Linköping University
Linköping, 58183
Sweden


Sthal Fabrice
Département Temps-Fréquence
Institut FEMTO-ST
26, Rue de l’épitaphe
Besançon Cedex
France


Terwagne Guy
Department of Physics, LARN, FUNDP
61, Rue de Bruxelles
Namur, 5000
Belgium


Vaz Filipe
Centro de Física, Universidade do Minho
Braga, 4710-057
Portugal


Vetter Jörg
Sulzer Metaplas GmbH, Am Böttcherberg 30-38
Bergisch Gladbach, 51427
Germany


Wu Yung-Hsien
Department of Engineering and System Science
National Tsing Hua University
101, Kuang Fu Road, Section 2
Hsinchu
Taiwan, R.O.C




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