Editors: Filipe Vaz, Nicolas Martin, Martin Fenker

Metallic Oxynitride Thin Films by Reactive Sputtering and Related Deposition Methods: Process, Properties and Applications

eBook: US $39 Special Offer (PDF + Printed Copy): US $159
Printed Copy: US $140
Library License: US $156
ISBN: 978-1-60805-157-1 (Print)
ISBN: 978-1-60805-156-4 (Online)
Year of Publication: 2013
DOI: 10.2174/97816080515641130101


Oxynitride thin film technology is rapidly impacting a broad spectrum of applications, ranging from decorative functions (through optoelectronics) to corrosion resistance. Developing a better understanding of the relationships between deposition processes, structure and composition of the deposited films is critical to the continued evolution of these applications. This e-book provides valuable information about the process modeling, fabrication and characterization of metallic oxynitride-based thin films produced by reactive sputtering and some related deposition processes. Its contents are spread in twelve main and concise chapters through which the book thoroughly reviews the bases of oxynitride thin film technology and deposition processes, sputtering processes and the resulting behaviors of these oxynitride thin films. More importantly, the solutions for the growth of oxynitride technology are given in detail with an emphasis on some particular compounds. This is a valuable resource for academic learners studying materials science and industrial coaters, who are concerned not only about fundamental aspects of oxynitride synthesis, but also by their innate material characteristics.

About the Editors

- Pp. i-iii (3)
Filipe Vaz, Nicolas Martin, Martin Fenker
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- Pp. iv
Allan Matthews
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- Pp. v-vii (3)
Filipe Vaz, Nicolas Martin, Martin Fenker
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List of Contributors

- Pp. viii-xi (4)
Filipe Vaz, Nicolas Martin, Martin Fenker
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Modelling of Reactive Sputter Deposition of Oxynitrides

- Pp. 3-26 (24)
Sören Berg, Tomas Nyberg, Diederik Depla
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Reactive Gas Pulsing Process for Oxynitride Thin Films

- Pp. 27-50 (24)
Nicolas Martin, Jan Lintymer, Aurélien Besnard, Fabrice Sthal
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Exploring the Potential of High Power Impulse Magnetron Sputtering for Tailoring the Chemical Composition and the Properties in Metal Oxynitride Films

- Pp. 51-63 (13)
Kostas Sarakinos
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Tuneable Properties of Zirconium Oxynitride Thin Films

- Pp. 64-112 (49)
Pedro Carvalho, Luis Cunha, Nuno Pessoa Barradas, Eduardo Alves, Juan Pedro Espinós, Filipe Vaz
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Gradual Evolution of the Properties in Titanium Oxynitride Thin Films

- Pp. 113-132 (20)
Jean-Marie Chappé, Nicolas Martin
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Growth and Characterization of Chromium Oxynitride Thin Films Prepared Using Reactive Unbalanced Magnetron Sputtering in Presence of Air as Reactive Gas

- Pp. 133-162 (30)
Saïd Agouram, Guy Terwagne, Franz Bodart
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A Comprehensive Study of the Properties of Sputtered NbO<sub>x</sub>N<sub>y</sub> Thin Films

- Pp. 163-194 (32)
Martin Fenker
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Tuneable Properties of Aluminium Oxynitride Thin Films

- Pp. 195-229 (35)
Joel Borges, Nuno P. Barradas, Eduardo Alves, Nicolas Martin, Marie-France Beaufort, Sophie Camelio, Dominique Eyidi, Thierry Girardeau, Fabien Paumier, Jean-Paul Rivière, Filipe Vaz, Luis Marques
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HfSiON Films Deposited by Radio Frequency Reactive Sputtering

- Pp. 230-253 (24)
Li-Ping Feng, Zheng-Tang Liu
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Properties of Oxynitride Thin Films for Biomedical Applications

- Pp. 254-264 (11)
Martin Fenker
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Oxynitrides and Oxides Deposited by Cathodic Vacuum Arc

- Pp. 265-284 (20)
Jörg Vetter
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Application of Oxynitrides for Microelectronic Devices and Gas Barriers

- Pp. 285-339 (55)
Yung-Hsien Wu, Jia-Hong Huang
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Author Index

- Pp. 340-341 (2)
Filipe Vaz, Nicolas Martin, Martin Fenker
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Subject Index

- Pp. 342-345 (4)
Filipe Vaz, Nicolas Martin, Martin Fenker
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