Author: Terence K.S. Wong

Semiconductor Strain Metrology: Principles and Applications

eBook: US $59 Special Offer (PDF + Printed Copy): US $136
Printed Copy: US $107
Library License: US $236
ISBN: 978-1-60805-554-8 (Print)
ISBN: 978-1-60805-359-9 (Online)
Year of Publication: 2012
DOI: 10.2174/97816080535991120101

Introduction

This book surveys the major and newly developed techniques for semiconductor strain metrology. Semiconductor strain metrology has emerged in recent years as a topic of great interest to researchers involved in thin film and nanoscale device characterization. This e-book employs a tutorial approach to explain the principles and applications of each technique specifically tailored for graduate students and postdoctoral researchers. Selected topics include optical, electron beam, ion beam and synchrotron x-ray techniques. Unlike earlier references, this e-book specifically discusses strain metrology as applied to semiconductor devices with both depth and focus.

Contributors

Author(s):
Terence K.S. Wong
Nanyang Technological University
Singapore




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