Ion Implantation and Activation

Volume 3


Kunihiro Suzuki

DOI: 10.2174/97816080579241130301
eISBN: 978-1-60805-792-4, 2013
ISBN: 978-1-60805-793-1
ISSN: 2589-2940 (Print)
ISSN: 2215-0005 (Online)

Indexed in: EBSCO.

Ion Implantation and Activation – Volume 3 presents the derivation process of related models in a comprehensive step ...[view complete introduction]
US $
Buy Personal eBook
Order Library eBook
Order Printed Copy
Order PDF + Printed Copy (Special Offer)

*(Excluding Mailing and Handling)

🔒Secure Checkout Personal information is secured with SSL technology
Download Flyer

Diffusion Under Thermal Equilibrium

- Pp. 3-34 (32)

Kunihiro Suzuki


We derive a diffusion flux and diffusion equation step by step, starting with a rough sketch one to a practical one. The flux is described with the paring with point defects, and the dependence of diffusion coefficients on doping concentration is emerged. We can predict diffusion profiles by solving the equation.

Purchase Chapter  Book Details


Webmaster Contact: Copyright © 2019 Bentham Science