Chapter 5

Dose Loss

Kunihiro Suzuki


Ion implanted impurity also plays a role for sputtering substrate atoms. The profiles are influenced by the sputtering. The database for the sputtering has also been developed. We described a model for the profiles where sputtering phenomenon is included. The model predicts the profile becomes invariable when the dose exceeds a certain value.

Total Pages: 69-77 (9)

Purchase Chapter  Book Details


.Ion Implantation and Activation.
.Ion Implantation and Activation.
.Classical Mechanics and Quantum Mechanics: An Historic-Axiomatic Approach.