Chapter 2

Heterostructure Growth

Halyna Khlyap

Abstract

Principal technologies used for heterostructures growth are described: molecular beam epitaxy (MBE), metalorganic chemical vapor deposition (MOCVD), atomic layer deposition (ALD). The main tools for characterization of the structures obtained are presented along with recent experimental data on the most important structural and electrical properties of the heterostructures based on III-V and II-VI semiconductor materials.

Total Pages: 21-32 (12)

Purchase Chapter  Book Details

RELATED BOOKS

.Ion Implantation and Activation.
.Ion Implantation and Activation.
.Ion Implantation and Activation.
.Classical Mechanics and Quantum Mechanics: An Historic-Axiomatic Approach.